Buffer Couple Low-pressure plasma processing Anatase Alzheimer's disease Copper Carbon PECVD Atomic force microscopy A Chalcogenides CH4 A3 Physical vapor deposition processes Biomasse Band alignment Adsorption Oxides Bixbyite XPS Selenization Scanning electron microscopy 3 nm in size Cathepsin AZO thin films B3 Solar cells B2 Quaternary AlN Amyloid precursor Alloying Ablation laser Calcined clay Functionalization Bipolar resistive switching BRS Colloidal solution Chemical detection Aluminium nitride Kirkendall effect Capacitance Biofilms microbiens Magnetron sputtering Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation A-CNx Plasmas froids TiO2 Residual stress Transfert d'énergie Band gap Thin film Films Etching Carbon nanotubes CIGSe X-ray diffraction Amorphous Mott insulator Chemical and biological sensors Biocapteurs Chalcogenide glass CaTiO3Pr^3^+ Structure A Thin films Avalanche breakdown A Multilayers TEM Spectroscopic ellipsometry CHLORINE PLASMAS Thin films Ambipolar material Optical properties V2O3 Chalcogenide Resistive switching Carbon nitride B2 Semiconducting indium compounds C Photoelectron spectroscopy Carbon Nanotube BOMBARDMENT B1 Inorganic compounds Sputtering Nanotubes Plasma etching B2 Semiconducting alloys Titanium dioxide Non-volatile memory Aryl-diazonium salts NEXAFS Sol-gel SF 6 Semiconductors Nanocomposite Mott insulators Transmission electron microscopy X-ray photoelectron spectroscopy CNTs’ collapse Chalcogenides Applications industrielles Physical vapor deposition A1 Characterization Atomic layer etching AuCu alloy B Chemical synthesis Vanadium Sesquioxide