High-performance asymmetric micro-supercapacitors based on VN and RuN sputtered films - Université de Lille
Communication Dans Un Congrès Année : 2022

High-performance asymmetric micro-supercapacitors based on VN and RuN sputtered films

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Chimie
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Dates et versions

hal-04303538 , version 1 (23-11-2023)

Identifiants

  • HAL Id : hal-04303538 , version 1

Citer

Khac Huy Dinh, Kevin Robert, Florent Blanchard, Marielle Huvé, Pascal Roussel, et al.. High-performance asymmetric micro-supercapacitors based on VN and RuN sputtered films. CChESMate 1st meeting - Climate Change and Energy Solutions through Materials Science, Apr 2022, Lille, France. ⟨hal-04303538⟩
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